RECENT DEVELOPMENTS IN HGCDTE AND HGZNTE GROWTH FROM TE SOLUTIONS

被引:13
作者
CASTRO, CA
TREGILGAS, JH
机构
[1] Texas Instruments Inc, Dallas, TX,, USA, Texas Instruments Inc, Dallas, TX, USA
关键词
D O I
10.1016/0022-0248(90)90711-S
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
19
引用
收藏
页码:138 / 145
页数:8
相关论文
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