FE-DOPED SEMIINSULATING INP GROWN BY CHLORIDE VAPOR-PHASE EPITAXY

被引：9

作者：

TANAKA, K

NAKAI, K

AOKI, O

SUGAWARA, M

WAKAO, K

YAMAKOSHI, S

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 61卷 / 09期

关键词：

D O I：

10.1063/1.338385

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：4698 / 4700

页数：3

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