QUARTER-MICRON LITHOGRAPHY WITH A WET-SILYLATED AND DRY-DEVELOPED COMMERCIAL PHOTORESIST

被引：2

作者：

GOGOLIDES, E ^{[1
]}

TZEVELEKIS, D ^{[1
]}

TSOI, E ^{[1
]}

HATZAKIS, M ^{[1
]}

GOETHALS, AM ^{[1
]}

BAIK, KH ^{[1
]}

VANROEY, F ^{[1
]}

机构：

[1] INTERUNIV MICROELECTR CTR,IMECVZW,B-3001 LOUVAIN,BELGIUM

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587574

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3914 / 3918

页数：5

共 14 条

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