VISCOELASTIC BEHAVIOR OF OXIDE-FILMS ON SILICON-CRYSTALS

被引：18

作者：

NISHINO, Y ^{[1
]}

IMURA, T ^{[1
]}

机构：

[1] NAGOYA UNIV,DEPT MET,CHIKUSA KU,NAGOYA,AICHI 464,JAPAN

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1982年 / 74卷 / 01期

关键词：

D O I：

10.1002/pssa.2210740123

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：193 / 200

页数：8

共 11 条

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[8] X-RAY-DIFFRACTION TOPOGRAPHS OF SILICON CRYSTALS WITH SUPERPOSED OXIDE FILM .1. THEORY AND COMPUTATIONAL PROCEDURES [J].

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[9] STRAINING APPARATUS FOR DYNAMIC OBSERVATION BY X-RAY TOPOGRAPHY [J].

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[10] X-RAY-DIFFRACTION TOPOGRAPHS OF SILICON CRYSTALS WITH SUPERPOSED OXIDE FILM .2. PENDELLOSUNG FRINGES - COMPARISON OF EXPERIMENT WITH THEORY [J].

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