MEASUREMENTS OF THE MECHANICAL-BEHAVIOR OF MICROMACHINED SILICON AND SILICON-NITRIDE MEMBRANES FOR MICROPHONES, PRESSURE SENSORS AND GAS-FLOW METERS

被引:39
作者
SCHELLIN, R [1 ]
HESS, G [1 ]
KUHNEL, W [1 ]
THIELEMANN, C [1 ]
TROST, D [1 ]
WACKER, J [1 ]
STEINMANN, R [1 ]
机构
[1] TH DARMSTADT,INST STAHLBAU & WERKSTOFFMECH,D-64283 DARMSTADT,GERMANY
关键词
D O I
10.1016/0924-4247(94)80125-8
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper mainly presents the experimental determination of the small deflection behaviour of boron-implanted silicon-nitride and highly boron-doped silicon diaphragms for micromachined silicon subminiature microphones. The additional implantation of boron into silicon-nitride diaphragms reduces the intrinsic stress in the deposited amorphous films. The minimum detectable deflection, using a Mach-Zehnder interferometer, is about 0.02 nm for dynamic measurements (A-weighted filtering). The largest measurable deflection (where nonlinearities of the interferometer are negligible) is strongly influenced by the wavelength of the laser and is about 10 nm. Thus, applying this method to pressure sensors and ps flow meters, the pressure range is restricted. In order to achieve a high sensitivity of the measuring apparatus and a low detectable deflection amplitude a feedback configuration stabilizes the interferometer in the most sensitive operation points.
引用
收藏
页码:287 / 292
页数:6
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