SPUTTER DEPOSITION OF PLATINUM FILMS IN ARGON OXYGEN AND NEON OXYGEN DISCHARGES

被引：29

作者：

AITA, CR

TRAN, NC

机构：

[1] UNIV WISCONSIN,SURFACE STUDIES LAB,MILWAUKEE,WI 53201

[2] UNIV WISCONSIN,CTR MAT SCI,MADISON,WI 53706

来源：

关键词：

D O I：

10.1063/1.334035

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：958 / 963

页数：6

共 37 条

[1] THE EFFECT OF O-2 ON REACTIVELY SPUTTERED ZINC-OXIDE
AITA, CR
PURDES, AJ
LAD, RJ
FUNKENBUSCH, PD
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (10) : 5533 - 5536
[2] ENHANCEMENT OF TA+ FLUX BY SUBSTRATE BIASING DURING SPUTTER DEPOSITION OF TANTALUM NITROGEN FILMS
AITA, CR
MYERS, TA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 348 - 351
[3] ARGON-OXYGEN INTERACTION IN RF-SPUTTERING GLOW-DISCHARGES
AITA, CR
MARHIC, ME
[J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) : 6584 - 6587
[4] OPTICAL-EMISSION FROM NEON OXYGEN RF SPUTTERING GLOW-DISCHARGES
AITA, CR
MARHIC, ME
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (01): : 69 - 73
[5] AITA CR, 1981, J APPL PHYS, V51, P6405
[6] AITA CR, 1983, J APPL PHYS, V54, P6052
[7] BARBEAU MA, 1981, SURF SCI, V102, P99
[8] ESCA STUDY OF TERMINATION OF PASSIVATION OF ELEMENTAL METALS
BARR, TL
[J]. JOURNAL OF PHYSICAL CHEMISTRY, 1978, 82 (16) : 1801 - 1810
[9] BAUER E, 1964, SINGLE CRYSTAL FILMS, P43
[10] BAUER E, 1962, 9 T VAC S AM VAC SOC, P35