LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY UTILIZING THE STEERING OF THE ELECTRON-BEAM IN THE STORAGE RING

被引：9

作者：

TANINO, H

HOH, K

HIRATA, M

ICHIMURA, S

ATODA, N

TOMIMASU, T

NOGUCHI, T

SUGIYAMA, S

YAMAZAKI, T

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1983年 / 22卷 / 11期

关键词：

D O I：

10.1143/JJAP.22.L677

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L677 / L679

页数：3

共 9 条

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