MAGNETRON ION ETCHING WITH CF4 BASED PLASMAS - EFFECTS OF MAGNETIC-FIELD ON PLASMA CHEMISTRY

被引：16

作者：

BRIGHT, AA

KAUSHIK, S

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.584781

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：542 / 546

页数：5

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