FOCUSED ION-BEAM TECHNOLOGY

There has been an increasing interest in focused ion beam processing for applications to microfabrication technology. Many high-brightness, submicron-meter focused ion beam system have already been developed. Using these focused ion beam systems, various maskless processing techniques have been developed. In these techniques, focused ion beams are irradiated by scanning them in the desired area and device patterns are formed without using lithography masks. Therefore, the process is greatly simplified. Moreover, new microfabrication processes such as total vacuum process are possible. In this paper, recent developments in focused ion beam technology will be reviewed putting emphasis on low energy focused ion beam techniques and effect of radiation damage. © 1990.