PREPARATION OF SIO2 FILM BY PHOTOINDUCED CHEMICAL VAPOR-DEPOSITION USING A DEUTERIUM LAMP AND ITS ANNEALING EFFECT

被引：34

作者：

TOYODA, Y

INOUE, K

OKUYAMA, M

HAMAKAWA, Y

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1987年 / 26卷 / 06期

关键词：

D O I：

10.1143/JJAP.26.835

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：835 / 840

页数：6

共 22 条

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