HOMOGENEOUS GAS-PHASE NUCLEATION OF SILANE IN LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION (LPCVD)

被引:28
作者
QIAN, ZM [1 ]
MICHIEL, H [1 ]
VANAMMEL, A [1 ]
NIJS, J [1 ]
MERTENS, R [1 ]
机构
[1] INTERUNIV MICROELECTR CENTRUM,B-3030 LEUVEN,BELGIUM
关键词
D O I
10.1149/1.2096275
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
73
引用
收藏
页码:2378 / 2379
页数:2
相关论文
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