共 14 条
[2]
BROWN SC, 1966, BASIC DATA PLASMA PH, P141
[3]
BROWN SC, 1966, BASIC EATA PLASMA PH, P143
[6]
ITATANI R, 1990, 7TH P S PLASM P TOKY, P81
[7]
ITATANI R, 1991, 8TH P S PLASM PROC N, P117
[8]
LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION METHOD UTILIZING AN ELECTRON-CYCLOTRON RESONANCE PLASMA
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS,
1983, 22 (04)
:L210-L212
[9]
REACTIVE ION-BEAM ETCHING USING A BROAD BEAM ECR ION-SOURCE
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS,
1982, 21 (01)
:L4-L6
[10]
ELECTRON-CYCLOTRON RESONANCE PLASMA DEPOSITION TECHNIQUE USING RAW-MATERIAL SUPPLY BY SPUTTERING
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS,
1984, 23 (08)
:L534-L536