MORPHOLOGICAL PROPERTIES OF CHEMICAL-VAPOR-DEPOSITED ALN FILMS

被引：61

作者：

RODRIGUEZ-CLEMENTE, R

ASPAR, B

AZEMA, N

ARMAS, B

COMBESCURE, C

DURAND, J

FIGUERAS, A

机构：

[1] IMP, CNRS, F-66120 ODEILLO, FRANCE

[2] ENSC, CNRS, PHYSICOCHIM MAT LAB, F-34053 MONTPELLIER, FRANCE

来源：

JOURNAL OF CRYSTAL GROWTH | 1993年 / 133卷 / 1-2期

关键词：

D O I：

10.1016/0022-0248(93)90103-4

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

In this paper we analyse some results on AlN CVD film deposition, published in the literature, from a morphological point of view, and we propose a model to explain the observed preferential orientations based on the reactivity of the AlN crystal faces of the equilibrium form.

引用

收藏

页码：59 / 70

页数：12

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