COMPARISON OF SI(100) AND SI(111) SURFACES AFTER MODERATE TO HIGH EXPOSURES OF XEF2

被引：28

作者：

ROOP, B ^{[1
]}

JOYCE, S ^{[1
]}

SCHULTZ, JC ^{[1
]}

STEINFELD, JI ^{[1
]}

机构：

[1] MIT,DEPT CHEM,CAMBRIDGE,MA 02139

来源：

SURFACE SCIENCE | 1986年 / 173卷 / 2-3期

关键词：

D O I：

10.1016/0039-6028(86)90202-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：455 / 464

页数：10

共 22 条

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