AN IMPROVED HYDRODYNAMIC TRANSPORT MODEL FOR SILICON

被引:67
作者
TANG, TW
RAMASWAMY, S
NAM, J
机构
[1] Department of Electrical and Computer Engineering, University of Massachusetts, Amherst
基金
美国国家科学基金会;
关键词
D O I
10.1109/16.223707
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
For the first time, a closed set of hydrodynamic equations for silicon device analysis is obtained with the aid of self-consistent Monte Carlo device simulation data. This set of macroscopic equations is derived without invoking any phenomenological relations such as the Fourier law for heat flow and the Wiedemann-Franz law for thermal conductivity. We have developed this model by taking the first four moments of the Boltzmann transport equation (BTE). This model takes into account the difference between the moments of the collision terms of the BTE both for bulk and inhomogeneous systems. We have also identified the cause of the spurious velocity overshoot sometimes predicted by other models. By introducing different levels of approximation, this system of hydrodynamic equations can be reduced to the conventional hydrodynamic or energy transport equations. This improved model appears to be more accurate than any existing computation for modeling silicon devices.
引用
收藏
页码:1469 / 1477
页数:9
相关论文
共 12 条
[1]   AN INVESTIGATION OF STEADY-STATE VELOCITY OVERSHOOT IN SILICON [J].
BACCARANI, G ;
WORDEMAN, MR .
SOLID-STATE ELECTRONICS, 1985, 28 (04) :407-416
[2]   AN IMPROVED ENERGY-TRANSPORT MODEL INCLUDING NONPARABOLICITY AND NONMAXWELLIAN DISTRIBUTION EFFECTS [J].
CHEN, DT ;
KAN, EC ;
RAVAIOLI, U ;
SHU, CW ;
DUTTON, RW .
IEEE ELECTRON DEVICE LETTERS, 1992, 13 (01) :26-28
[4]  
HANSCH W, 1986, J APPL PHYS, V60, P650, DOI 10.1063/1.337408
[5]   TRANSPORT-COEFFICIENTS FOR A SILICON HYDRODYNAMIC MODEL EXTRACTED FROM INHOMOGENEOUS MONTE-CARLO CALCULATIONS [J].
LEE, SC ;
TANG, TW .
SOLID-STATE ELECTRONICS, 1992, 35 (04) :561-569
[6]  
LEE SC, 1992, IEICE T ELECTRON, VE75C, P189
[7]  
NAM J, UNPUB NUMERICAL SOLU
[8]   DETERMINATION OF TRANSIENT REGIME OF HOT CARRIERS IN SEMICONDUCTORS, USING THE RELAXATION-TIME APPROXIMATIONS [J].
NOUGIER, JP ;
VAISSIERE, JC ;
GASQUET, D ;
ZIMMERMANN, J ;
CONSTANT, E .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (02) :825-832
[9]  
OU HH, 1987, IEEE T ELECTRON DEV, V34, P1533
[10]   INFLUENCE OF NONUNIFORM FIELD DISTRIBUTION ON FREQUENCY LIMITS OF GAAS FIELD-EFFECT TRANSISTORS [J].
SHUR, M .
ELECTRONICS LETTERS, 1976, 12 (23) :615-616