OPTIMUM BEAM ENERGY FOR HIGH DEPTH RESOLUTION SECONDARY-ION MASS-SPECTROMETRY

被引：20

作者：

CLEGG, JB

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1995年 / 13卷 / 01期

关键词：

D O I：

10.1116/1.579429

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：143 / 146

页数：4

共 9 条

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