INTERFACIAL REACTIONS ON ANNEALING MOLYBDENUM-SILICON MULTILAYERS

被引：141

作者：

HOLLOWAY, K ^{[1
]}

DO, KB ^{[1
]}

SINCLAIR, R ^{[1
]}

机构：

[1] STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 02期

关键词：

D O I：

10.1063/1.343425

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：474 / 480

页数：7

共 36 条

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