A MASS-SPECTROSCOPY STUDY OF METAL SILICIDE FORMATION

被引：7

作者：

ALY, ESM

STARK, JP

机构：

来源：

ACTA METALLURGICA | 1984年 / 32卷 / 06期

关键词：

D O I：

10.1016/0001-6160(84)90027-0

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

引用

页码：907 / 914

页数：8

共 15 条

[1] DEVELOPMENTS IN SECONDARY ION MASS-SPECTROSCOPY AND APPLICATIONS TO SURFACE STUDIES [J].

BENNINGHOVEN, A .

SURFACE SCIENCE, 1975, 53 (DEC) :596-625

[2] PT2SI AND PTSI FORMATION WITH HIGH-PURITY PT THIN-FILMS [J].

CANALI, C ;

CATELLANI, C ;

PRUDENZIATI, M ;

WADLIN, WH ;

EVANS, CA .

APPLIED PHYSICS LETTERS, 1977, 31 (01) :43-45

[3] IMPLANTED NOBLE-GAS ATOMS AS DIFFUSION MARKERS IN SILICIDE FORMATION [J].

CHU, WK ;

LAU, SS ;

MAYER, JW ;

MULLER, H .

THIN SOLID FILMS, 1975, 25 (02) :393-402

[4] GROWTH OF PLATINUM SILICIDE UNDER PROTECTIVE LAYERS [J].

JOUBERT, P ;

AUVRAY, P ;

GUIVARCH, A ;

PELOUS, G .

APPLIED PHYSICS LETTERS, 1977, 31 (11) :753-755

[5]

MCHUGH JA, 1975, METHODS SURFACE ANAL

[6] SOLID-SOLID REACTIONS IN PT-SI SYSTEMS [J].

MUTA, H ;

SHINODA, D .

JOURNAL OF APPLIED PHYSICS, 1972, 43 (06) :2913-+

[7] INFLUENCE OF NATURE OF SI SUBSTRATE ON NICKEL SILICIDE FORMED FROM THIN NI FILMS [J].

OLOWOLAFE, JO ;

NICOLET, MA ;

MAYER, JW .

THIN SOLID FILMS, 1976, 38 (02) :143-150

[8] KINETICS AND MECHANISM OF PLATINUM SILICIDE FORMATION ON SILICON [J].

POATE, JM ;

TISONE, TC .

APPLIED PHYSICS LETTERS, 1974, 24 (08) :391-393

[9] RADIOACTIVE SI-31 MARKER STUDIES OF METAL SILICIDE FORMATION - COMPUTER-SIMULATION [J].

PRETORIUS, R ;

BOTHA, AP .

THIN SOLID FILMS, 1982, 91 (02) :99-109

[10] MARKER STUDIES OF SILICIDE FORMATION, SILICON SELF-DIFFUSION AND SILICON EPITAXY USING RADIOACTIVE SILICON AND RUTHERFORD BACKSCATTERING [J].

PRETORIUS, R ;

RAMILLER, CL ;

NICOLET, MA .

NUCLEAR INSTRUMENTS & METHODS, 1978, 149 (1-3) :629-633

← 1 2 →