RADIOACTIVE SI-31 MARKER STUDIES OF METAL SILICIDE FORMATION - COMPUTER-SIMULATION

被引：9

作者：

PRETORIUS, R

BOTHA, AP

机构：

来源：

THIN SOLID FILMS | 1982年 / 91卷 / 02期

关键词：

D O I：

10.1016/0040-6090(82)90423-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：99 / 109

页数：11

共 16 条

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[2]

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[3] DETERMINATION OF THE DIFFUSING SPECIES AND MECHANISM OF DIFFUSION DURING CRSI2 FORMATION, USING SI-31 AS A MARKER [J].

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[8] SILICON SELF-DIFFUSION IN THIN SIO2 AND PTSI FILMS [J].

PRETORIUS, R ;

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THIN SOLID FILMS, 1981, 79 (01) :61-68

[9] RADIOACTIVE SILICON AS A MARKER IN THIN-FILM SILICIDE FORMATION [J].

PRETORIUS, R ;

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APPLIED PHYSICS LETTERS, 1977, 30 (10) :501-503

[10] STUDIES OF THE GROWTH AND OXIDATION OF METAL-SILICIDES USING RADIOACTIVE SI-31 AS TRACER [J].

PRETORIUS, R .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (01) :107-112

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