HIGHLY CONDUCTING AND TRANSPARENT SNO2 THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING ON LOW-TEMPERATURE SUBSTRATES

被引：86

作者：

MINAMI, T ^{[1
]}

NANTO, H ^{[1
]}

TAKATA, S ^{[1
]}

机构：

[1] KANAZAWA INST TECHNOL,ELECTRON DEVICE SYST LAB,NONOICHI,ISHIKAWA 921,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1988年 / 27卷 / 03期

关键词：

LOW-TEMPERATURE SUBSTRATES - RF MAGNETRON SPUTTERING - TIN DIOXIDE;

D O I：

10.1143/JJAP.27.L287

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Highly conducting and transparent thin films of undoped tin oxide (SnO//2) are prepared on unheated substrates ( less than equivalent to 90 degree C) by rf magnetron sputtering under an applied external dc magnetic field. The lowest resistivity obtained is 1. 9 multiplied by 10** minus **3 OMEGA cm. The SnO//2 films with a sheet resistance below 200 OMEGA /sq and an average visible transmittance (between 400 and 700 nm) above 85%, and below 300 OMEGA /sq and above 80% (including organic film substrate) can be obtained for the films deposited on glass substrates and organic film substrates, respectively.

引用

页码：L287 / L289

页数：3

共 18 条

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