PHOTOVOLTAGE SPECTRA OF METAL-SILICON (P-TYPE) DIODES NEAR INDIRECT ABSORPTION-EDGE OF SILICON

被引:8
作者
LEPPIHALME, M [1 ]
TUOMI, T [1 ]
机构
[1] TECH RES CTR FINLAND,SEMICOND LAB,SF-02150 ESPOO 15,FINLAND
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1976年 / 33卷 / 01期
关键词
D O I
10.1002/pssa.2210330112
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:125 / 133
页数:9
相关论文
共 18 条
[1]   FINE-STRUCTURE IN OPTICAL-ABSORPTION EDGE OF SILICON [J].
ANAGNOSTOPOULOS, C ;
SADASIV, G .
PHYSICAL REVIEW B, 1973, 7 (02) :733-739
[2]   INFLUENCE OF UNIAXIAL STRESS ON INDIRECT ABSORPTION EDGE IN SILICON AND GERMANIUM [J].
BALSLEV, I .
PHYSICAL REVIEW, 1966, 143 (02) :636-&
[3]   DETERMINATION OF HAFNIUM-P-TYPE SILICON SCHOTTKY-BARRIER HEIGHT [J].
BEGUWALA, M ;
CROWELL, CR .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (06) :2792-2794
[4]   CRITICAL POINT DETERMINATION BY DERIVATIVE OPTICAL SPECTROSCOPY [J].
BRAUNSTEIN, R ;
SCHREIBER, P ;
WELKOWSKY, M .
SOLID STATE COMMUNICATIONS, 1968, 6 (09) :627-+
[5]   THERMALLY-INDUCED CHANGES IN BARRIER HEIGHTS OF ALUMINUM CONTACTS TO PARA-TYPE AND NORMAL-TYPE SILICON [J].
CARD, HC .
SOLID STATE COMMUNICATIONS, 1975, 16 (01) :87-89
[6]  
CARDONA M, 1969, SOLID STATE PHYSIC S, V11, P113
[7]   VALLEY-ORBIT SPLITTING OF INDIRECT FREE EXCITON IN SILICON [J].
DEAN, PJ ;
YAFET, Y ;
HAYNES, JR .
PHYSICAL REVIEW, 1969, 184 (03) :837-&
[8]   INTENSITY OF OPTICAL ABSORPTION BY EXCITONS [J].
ELLIOTT, RJ .
PHYSICAL REVIEW, 1957, 108 (06) :1384-1389
[9]   The analysis of photoelectric sensitivity curves for clean metals at various temperatures [J].
Fowler, RH .
PHYSICAL REVIEW, 1931, 38 (01) :45-56
[10]   WAVELENGTH MODULATION OF PHOTORESPONSE NEAR INDIRECT EDGES OF SI, GE, AND GAP [J].
NISHINO, T ;
HAMAKAWA, Y .
PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1972, 50 (01) :345-&