EARLY STAGES OF EPITAXIAL COSI2 FORMATION ON SI(111) SURFACE AS INVESTIGATED BY ARUPS, XPS, LEED AND WORK FUNCTION VARIATION

被引:20
作者
PIRRI, C [1 ]
PERUCHETTI, JC [1 ]
GEWINNER, G [1 ]
DERRIEN, J [1 ]
机构
[1] CNRS,ETUD PROPRIETES ELECTR SOLIDES LAB,F-38042 GRENOBLE,FRANCE
关键词
D O I
10.1016/0039-6028(85)90527-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:1106 / 1112
页数:7
相关论文
共 10 条
  • [1] FORMATION AND STRUCTURE OF EPITAXIAL NISI2 AND COSI2
    CHEN, LJ
    MAYER, JW
    TU, KN
    [J]. THIN SOLID FILMS, 1982, 93 (1-2) : 135 - 141
  • [2] GIBSON JM, 1982, APPL PHYS LETT, V41, P818, DOI 10.1063/1.93699
  • [3] CHEMISORPTION OF CO ON CO(0001) - STRUCTURE AND ELECTRONIC-PROPERTIES
    GREUTER, F
    HESKETT, D
    PLUMMER, EW
    FREUND, HJ
    [J]. PHYSICAL REVIEW B, 1983, 27 (12): : 7117 - 7135
  • [4] DETERMINATION OF THE FERMI-LEVEL PINNING POSITION AT SI(111) SURFACES
    HIMPSEL, FJ
    HOLLINGER, G
    POLLAK, RA
    [J]. PHYSICAL REVIEW B, 1983, 28 (12): : 7014 - 7018
  • [5] COBALT DISILICIDE EPITAXIAL-GROWTH ON THE SILICON (111) SURFACE
    PIRRI, C
    PERUCHETTI, JC
    GEWINNER, G
    DERRIEN, J
    [J]. PHYSICAL REVIEW B, 1984, 29 (06): : 3391 - 3397
  • [6] Poate J M, 1978, THIN FILMS INTERDIFF
  • [7] DOUBLE HETEROEPITAXY IN THE SI (111)-COSI2-SI STRUCTURE
    SAITOH, S
    ISHIWARA, H
    FURUKAWA, S
    [J]. APPLIED PHYSICS LETTERS, 1980, 37 (02) : 203 - 205
  • [8] BONDING AND STRUCTURE OF COSI2 AND NISI2
    TERSOFF, J
    HAMANN, DR
    [J]. PHYSICAL REVIEW B, 1983, 28 (02): : 1168 - 1170
  • [9] GROWTH OF SINGLE-CRYSTAL COSI2 ON SI (111)
    TUNG, RT
    BEAN, JC
    GIBSON, JM
    POATE, JM
    JACOBSON, DC
    [J]. APPLIED PHYSICS LETTERS, 1982, 40 (08) : 684 - 686
  • [10] ELECTRON DELOCALIZATION AND CHARACTERIZATION OF L3MM AUGER-SPECTRA OF 3D TRANSITION-METALS
    YIN, LI
    TSANG, T
    ADLER, I
    [J]. PHYSICAL REVIEW B, 1977, 15 (06): : 2974 - 2983