FORMATION OF THIN-FILMS OF COSI2 - NUCLEATION AND DIFFUSION MECHANISMS

被引：183

作者：

DHEURLE, FM ^{[1
]}

PETERSSON, CS ^{[1
]}

机构：

[1] ROYAL INST TECHNOL,INST MICROWAVE TECHNOL,S-10044 STOCKHOLM 70,SWEDEN

来源：

THIN SOLID FILMS | 1985年 / 128卷 / 3-4期

关键词：

D O I：

10.1016/0040-6090(85)90080-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：283 / 297

页数：15

相关论文

共 35 条

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[8] DIFFUSION IN INTERMETALLIC COMPOUNDS WITH THE CAF2 STRUCTURE - A MARKER STUDY OF THE FORMATION OF NISI2 THIN-FILMS
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[9] DHEURLE F, 1982, UNPUB
[10] THERMAL FORMATION OF SIO2-FILMS OVER NISI, NISI2 AND COSI2 VIA SILICIDE DECOMPOSITION
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