THERMAL FORMATION OF SIO2-FILMS OVER NISI, NISI2 AND COSI2 VIA SILICIDE DECOMPOSITION

被引：30

作者：

DHEURLE, FM

机构：

来源：

THIN SOLID FILMS | 1983年 / 105卷 / 03期

关键词：

D O I：

10.1016/0040-6090(83)90292-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：285 / 292

页数：8

共 22 条

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