EFFECT OF VARYING THE COMPOSITION OF CO-POLYMERS OF GLYCIDYL METHACRYLATE AND 3-CHLOROSTYRENE (GMC) ON ELECTRON LITHOGRAPHIC PERFORMANCE

被引：6

作者：

NOVEMBRE, AE

BOWDEN, MJ

机构：

来源：

POLYMER ENGINEERING AND SCIENCE | 1983年 / 23卷 / 17期

关键词：

D O I：

10.1002/pen.760231711

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：975 / 979

页数：5

共 13 条

[1] CONTRAST IN THE ELECTRON-BEAM LITHOGRAPHY OF SUBSTITUTED AROMATIC HOMOPOLYMERS AND CO-POLYMERS [J].

FEIT, ED ;

THOMPSON, LF ;

WILKINS, CW ;

WURTZ, ME ;

DOERRIES, EM ;

STILLWAGON, LE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1997-2002

[2] PLASMA SILICON-OXIDE FILMS ON GARNET SUBSTRATES - MEASUREMENT OF THEIR THICKNESS AND REFRACTIVE-INDEX BY THE PRISM COUPLING TECHNIQUE [J].

HOU, TW ;

MOGAB, CJ .

APPLIED OPTICS, 1981, 20 (18) :3184-3188

[3] CHLOROMETHYLATED POLYSTYRENE AS A DRY ETCHING-RESISTANT NEGATIVE RESIST FOR SUB-MICRON TECHNOLOGY [J].

IMAMURA, S .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (09) :1628-1630

[4]

LYNCH WG, COMMUNICATION

[5] POST-IRRADIATION POLYMERIZATION OF E-BEAM NEGATIVE RESISTS - THEORETICAL-ANALYSIS AND METHOD OF INHIBITION [J].

OHNISHI, Y ;

ITOH, M ;

MIZUNO, K ;

GOKAN, H ;

FUJIWARA, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1141-1144

[6]

SHIRAISHI H, 1979, OCT P REG TECH C PHO, P56

[7]

TADA T, 1982, J ELECTROCHEM SOC, V5, P1070

[8] PGMA AS A HIGH-RESOLUTION, HIGH-SENSITIVITY NEGATIVE ELECTRON-BEAM RESIST [J].

TANIGUCHI, Y ;

HATANO, Y ;

SHIRAISHI, H ;

HORIGOME, S ;

NONOGAKI, S ;

NARAOKA, K .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1979, 18 (06) :1143-1148

[9] OXYGEN PLASMA REMOVAL OF THIN POLYMER-FILMS [J].

TAYLOR, GN ;

WOLF, TM .

POLYMER ENGINEERING AND SCIENCE, 1980, 20 (16) :1087-1092

[10]

Thompson L. T. E., COMMUNICATION

← 1 2 →