RELATION OF DEPOSITION CONDITIONS OF TI-N FILMS PREPARED BY DC MAGNETRON SPUTTERING TO THEIR MICROSTRUCTURE AND MACROSTRESS

A systematic study of the relation of the deposition conditions of Ti-N films prepared by d.c. magnetron sputtering to their microstructure and macrostress has been performed using two sets of alpha-Ti(N) and delta-TiN films. The variable parameter in the deposition was the combined parameter S(E) representing the energy delivered to the growing film. The threshold energy S(Etr) necessary for the transition from zone I to zone T of Thornton's structural zone model was investigated for both alpha-Ti(N) and delta-TiN films. S(Etr) for delta-TiN films is about one order of magnitude higher (S(E) = 0.9 MJ cm-3) than for alpha-Ti(N) films (S(E) = 0.15 MJ cm-3) according to X-ray diffraction. This finding can be explained by a difference in the melting temperature T(m) of TiN (T(m) = 3200 K) and that of Ti (T(m) = 1930 K). Values of the macrostress of Ti-N films as a function of S(E) are also given.