ALTERNATIVES TO ARSINE - THE ATMOSPHERIC-PRESSURE ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION GROWTH OF GAAS USING TRIETHYLARSENIC

被引：54

作者：

SPECKMAN, DM

WENDT, JP

机构：

来源：

APPLIED PHYSICS LETTERS | 1987年 / 50卷 / 11期

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D O I：

10.1063/1.98063

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：676 / 678

页数：3

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