CHARACTERIZATION OF PLASMA-DEPOSITED SILICON-NITRIDE FILMS BY AUGER-ELECTRON SPECTROSCOPY AND ELECTRON-ENERGY LOSS SPECTROSCOPY

被引：18

作者：

HEZEL, R

LIESKE, N

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 03期

关键词：

D O I：

10.1063/1.331630

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1671 / 1674

页数：4

共 26 条

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