TRANSITION-METAL SILICIDES - LOW RESISTIVITY ALTERNATIVES FOR POLYSILICON AND METALS IN INTEGRATED-CIRCUITS

被引：8

作者：

MURARKA, SP

机构：

来源：

JOURNAL OF METALS | 1984年 / 36卷 / 07期

关键词：

D O I：

10.1007/BF03338505

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

引用

页码：57 / 60

页数：4

共 15 条

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[4] RESISTIVITIES OF THIN-FILM TRANSITION-METAL SILICIDES [J].

MURARKA, SP ;

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[6]

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[7]

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[8] REVIEW OF BINARY ALLOY FORMATION BY THIN-FILM INTERACTIONS [J].

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[9]

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[10] SPEED LIMITATIONS DUE TO INTERCONNECT TIME CONSTANTS IN VLSI INTEGRATED-CIRCUITS [J].

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