EVALUATION OF SILICON FILMS AS A DIFFUSION MASK AND ENCAPSULANT FOR INP AND GAAS

被引：6

作者：

CHIN, AK

CAMLIBEL, I

MARCHUT, L

SINGH, S

VANUITERT, LG

ZYDZIK, GJ

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 58卷 / 09期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1063/1.335741

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：3630 / 3633

页数：4

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