PHOTOINDUCED CHEMICAL VAPOR-DEPOSITION OF SIO2 FILM USING DIRECT EXCITATION PROCESS BY DEUTERIUM LAMP

被引：43

作者：

OKUYAMA, M

TOYODA, Y

HAMAKAWA, Y

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1984年 / 23卷 / 02期

关键词：

D O I：

10.1143/JJAP.23.L97

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L97 / L99

页数：3

共 13 条

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