AN INVESTIGATION OF OXYGEN INDIFFUSION DURING LASER CLEANING ANNEALING OF SILICON BY MEANS OF THE O-16(ALPHA,ALPH-O)O-16 RESONANCE SCATTERING

被引:26
作者
WANG, ZL
WESTENDORP, JFM
SARIS, FW
机构
来源
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH | 1983年 / 211卷 / 01期
关键词
D O I
10.1016/0167-5087(83)90569-0
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
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页码:193 / 201
页数:9
相关论文
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