THE INFLUENCE OF ATOMIC MIXING ON SIMS DEPTH PROFILING OF THIN BURIED LAYERS

[1] DEPTH RESOLUTION OF SPUTTER PROFILING [J]. APPLIED PHYSICS, 1979, 18 (02): : 131 - 140

[2] A 1ST ORDER DIFFUSION-APPROXIMATION TO ATOMIC REDISTRIBUTION DURING ION-BOMBARDMENT OF SOLIDS, .2. FINITE-RANGE APPROXIMATION [J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1981, 55 (1-2): : 99 - 110

[3] PREFERRED SPUTTERING ON BINARY ALLOY SURFACES OF THE AL-PD-SISYSTEM [J]. SURFACE SCIENCE, 1979, 85 (01) : 19 - 28

[4] DEPTH-PROFILING OF CU-NI SANDWICH SAMPLES BY SECONDARY ION MASS-SPECTROMETRY [J]. APPLIED PHYSICS, 1975, 8 (04): : 359 - 360

[5] INFLUENCE OF ATOMIC MIXING AND PREFERENTIAL SPUTTERING ON DEPTH PROFILES AND INTERFACES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 121 - 127

[6] LITTMARK U, 1980, NUCL INSTRUM METHODS, V168, P239

[7] SECONDARY ION MASS-SPECTROMETRY AND ITS RELATION TO HIGH-ENERGY ION-BEAM ANALYSIS TECHNIQUES [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1981, 191 (1-3): : 297 - 307

[8] DEPTH DEPENDENCE OF ATOMIC MIXING BY ION-BEAMS [J]. APPLIED PHYSICS LETTERS, 1979, 35 (10) : 825 - 828

[9] IMPLANTATION AND ION-BEAM MIXING IN THIN-FILM ANALYSIS [J]. NUCLEAR INSTRUMENTS & METHODS, 1981, 182 (APR): : 15 - 24

[10] Winterbon K.B., 1975, ION IMPLANTATION RAN, V2

[1] DEPTH RESOLUTION OF SPUTTER PROFILING [J]. APPLIED PHYSICS, 1979, 18 (02): : 131 - 140

[2] A 1ST ORDER DIFFUSION-APPROXIMATION TO ATOMIC REDISTRIBUTION DURING ION-BOMBARDMENT OF SOLIDS, .2. FINITE-RANGE APPROXIMATION [J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1981, 55 (1-2): : 99 - 110

[3] PREFERRED SPUTTERING ON BINARY ALLOY SURFACES OF THE AL-PD-SISYSTEM [J]. SURFACE SCIENCE, 1979, 85 (01) : 19 - 28

[4] DEPTH-PROFILING OF CU-NI SANDWICH SAMPLES BY SECONDARY ION MASS-SPECTROMETRY [J]. APPLIED PHYSICS, 1975, 8 (04): : 359 - 360

[5] INFLUENCE OF ATOMIC MIXING AND PREFERENTIAL SPUTTERING ON DEPTH PROFILES AND INTERFACES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 121 - 127

[6] LITTMARK U, 1980, NUCL INSTRUM METHODS, V168, P239

[7] SECONDARY ION MASS-SPECTROMETRY AND ITS RELATION TO HIGH-ENERGY ION-BEAM ANALYSIS TECHNIQUES [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1981, 191 (1-3): : 297 - 307

[8] DEPTH DEPENDENCE OF ATOMIC MIXING BY ION-BEAMS [J]. APPLIED PHYSICS LETTERS, 1979, 35 (10) : 825 - 828

[9] IMPLANTATION AND ION-BEAM MIXING IN THIN-FILM ANALYSIS [J]. NUCLEAR INSTRUMENTS & METHODS, 1981, 182 (APR): : 15 - 24

[10] Winterbon K.B., 1975, ION IMPLANTATION RAN, V2