LASER-INDUCED PHOTOTHERMAL REFLECTANCE INVESTIGATION OF SILICON DAMAGED BY ARSENIC ION-IMPLANTATION - A TEMPERATURE STUDY

被引：21

作者：

VITKIN, IA ^{[1
]}

CHRISTOFIDES, C ^{[1
]}

MANDELIS, A ^{[1
]}

机构：

[1] UNIV TORONTO,ONTARIO LASER & LIGHTWAVE RES CTR,TORONTO M5S 1A4,ONTARIO,CANADA

来源：

APPLIED PHYSICS LETTERS | 1989年 / 54卷 / 24期

关键词：

D O I：

10.1063/1.101088

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2392 / 2394

页数：3

共 35 条

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