DEPTH DEPENDENCE OF NUCLEATION IN IMPLANTED POLYCRYSTALLINE SILICON FILMS ON SIO2

被引：2

作者：

IVERSON, RB

REIF, R

机构：

来源：

MATERIALS LETTERS | 1987年 / 5卷 / 11-12期

关键词：

D O I：

10.1016/0167-577X(87)90065-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：460 / 462

页数：3

共 13 条

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[9] IMPLANT-DOSE DEPENDENCE OF GRAIN-SIZE AND (110) TEXTURE ENHANCEMENTS IN POLYCRYSTALLINE SI FILMS BY SEED SELECTION THROUGH ION CHANNELING [J].

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