MODELING OF MOS RADIATION AND POST IRRADIATION EFFECTS

被引:10
作者
NEAMEN, DA [1 ]
机构
[1] USAF,WEAPONS LAB,DEPT ELECTR & COMP ENGN,ALBUQUERQUE,NM 87131
关键词
D O I
10.1109/TNS.1984.4333526
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1439 / 1443
页数:5
相关论文
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