EFFECTS OF PLATINUM SILICIDE THICKNESS AND ANNEALING TEMPERATURE ON ARSENIC REDISTRIBUTION

被引：12

作者：

LEW, PW

HELMS, CR

机构：

[1] STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305

[2] STANFORD UNIV,DEPT ELECT ENGN,STANFORD,CA 94305

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 56卷 / 12期

关键词：

D O I：

10.1063/1.333908

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3418 / 3427

页数：10

共 38 条

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