X-RAY-LITHOGRAPHY APPLIED TO THE FABRICATION OF ONE MICROMETER N-CHANNEL METAL-OXIDE SEMICONDUCTOR CIRCUITS

被引：2

作者：

FULS, EN

机构：

来源：

OPTICAL ENGINEERING | 1983年 / 22卷 / 02期

关键词：

D O I：

10.1117/12.7973082

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：199 / 202

页数：4

共 8 条

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