GAAS AND GAALAS REACTIVE ION ETCHING IN BCL3-CL2 MIXTURE

被引:15
作者
TAMURA, H
KURIHARA, H
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1984年 / 23卷 / 09期
关键词
D O I
10.1143/JJAP.23.L731
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:L731 / L733
页数:3
相关论文
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