SPATIALLY RESOLVED OPTICAL-EMISSION STUDIES OF FLUOROCARBON RF PLASMA THROUGH THE USE OF UV-TRANSMITTING OPTICAL FIBERS

被引：26

作者：

SELWYN, GS ^{[1
]}

KAY, E ^{[1
]}

机构：

[1] IBM CORP,RES LAB,SAN JOSE,CA 95193

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 1985年 / 5卷 / 02期

关键词：

D O I：

10.1007/BF00566214

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：183 / 199

页数：17

共 32 条

[1]

[Anonymous], IDENTIFICATION MOL S

[2]

BASHKIN S, 1975, ATOMIC ENERGY LEVELS, V1, P56

[3] DETECTION OF FLUORESCENCE FROM O-ATOMS AND N-ATOMS INDUCED BY 2-PHOTON ABSORPTION [J].

BISCHEL, WK ;

PERRY, BE ;

CROSLEY, DR .

APPLIED OPTICS, 1982, 21 (08) :1419-1429

[4] 2-PHOTON LASER-INDUCED FLUORESCENCE IN OXYGEN AND NITROGEN-ATOMS [J].

BISCHEL, WK ;

PERRY, BE ;

CROSLEY, DR .

CHEMICAL PHYSICS LETTERS, 1981, 82 (01) :85-88

[5]

BRUECK SRJ, 1983, 6TH INT S PLASM CHEM

[6] OPTICAL-EMISSION SPECTROSCOPY OF REACTIVE PLASMAS - A METHOD FOR CORRELATING EMISSION INTENSITIES TO REACTIVE PARTICLE DENSITY [J].

COBURN, JW ;

CHEN, M .

JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) :3134-3136

[7] DEPENDENCE OF F-ATOM DENSITY ON PRESSURE AND FLOW-RATE IN CF4 GLOW-DISCHARGES AS DETERMINED BY EMISSION-SPECTROSCOPY [J].

COBURN, JW ;

CHEN, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02) :353-356

[8] SPECTROSCOPIC DIAGNOSTICS OF CF4-O2 PLASMAS DURING SI AND SIO2 ETCHING PROCESSES [J].

DAGOSTINO, R ;

CRAMAROSSA, F ;

DEBENEDICTIS, S ;

FERRARO, G .

JOURNAL OF APPLIED PHYSICS, 1981, 52 (03) :1259-1265

[9]

DAGOSTINO R, 1981, PLASMA CHEM PLASMA P, V1, P365

[10]

DILKS A, 1979, CHEM SOC S SER, V108, P193

← 1 2 3 4 →