THE RELATIONSHIP BETWEEN THE BENDING STRESS IN SILICON-WAFERS AND THE MECHANICAL STRENGTH OF SILICON-CRYSTALS

被引:11
作者
FUKUDA, T
机构
[1] Advanced Process Development Division, Fujitsu Limited (C-850), Nakahara-ku, Kawasaki, 211
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1995年 / 34卷 / 6A期
关键词
BENDING STRESS; SILICON; MECHANICAL STRENGTH; UPPER YIELD STRESS; STRAIN RATE; ELASTIC THEORY;
D O I
10.1143/JJAP.34.3209
中图分类号
O59 [应用物理学];
学科分类号
摘要
Silicon wafers horizontally stacked in a vertical furnace bend downward due to their weight. Using a linear elastic theory, we calculated the shear stress caused by the wafer bending and investigated the mechanical strength by comparing the shear stress with the upper yield stress of silicon crystals. We concluded that the maximum shear stress increased with the increase in the wafer diameter, 0.20, 0.30, and 0.55 MPa for 6, 8, and 12 inch wafers. In bending the 12 inch wafers, oxygen precipitates, lowering the upper yield stress, caused serious wafer warping because the shear stress exceeded the lowered yield stress.
引用
收藏
页码:3209 / 3215
页数:7
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