EFFECT OF DIFFERENT CATION-ANION BOND STRENGTHS ON METAL TERNARY-SEMICONDUCTOR INTERFACE FORMATION - CU/HG0.75CD0.25TE AND CU/CDTE

被引:26
作者
FRIEDMAN, DJ
CAREY, GP
LINDAU, I
SPICER, WE
机构
来源
PHYSICAL REVIEW B | 1986年 / 34卷 / 08期
关键词
D O I
10.1103/PhysRevB.34.5329
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:5329 / 5342
页数:14
相关论文
共 38 条
  • [1] ABRUPTNESS OF SEMICONDUCTOR-METAL INTERFACES
    BRILLSON, LJ
    BRUCKER, CF
    STOFFEL, NG
    KATNANI, AD
    MARGARITONDO, G
    [J]. PHYSICAL REVIEW LETTERS, 1981, 46 (13) : 838 - 841
  • [2] BONDING AND DIFFUSION AT AL AND AU INTERFACES WITH CDS
    BRILLSON, LJ
    BAUER, RS
    BACHRACH, RZ
    MCMENAMIN, JC
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (01): : 476 - 480
  • [3] ROLE OF CATION DISSOCIATION IN SCHOTTKY-BARRIER FORMATION AT II-VI COMPOUND SEMICONDUCTOR METAL INTERFACES
    BRUCKER, CF
    BRILLSON, LJ
    [J]. THIN SOLID FILMS, 1982, 93 (1-2) : 67 - 74
  • [4] CAREY GP, UNPUB
  • [5] CHANGES IN THE LOCAL CHEMICAL-COMPOSITION DURING THE HG1-XCDXTE-AL INTERFACE FORMATION
    DANIELS, RR
    MARGARITONDO, G
    DAVIS, GD
    BYER, NE
    [J]. APPLIED PHYSICS LETTERS, 1983, 42 (01) : 50 - 52
  • [6] INTERACTIONS BETWEEN CLEAVED (HG, CD)TE SURFACES AND DEPOSITED OVERLAYERS OF AL AND INDIUM
    DAVIS, GD
    BYER, NE
    RIEDEL, RA
    MARGARITONDO, G
    [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (06) : 1915 - 1921
  • [7] DEPOSITION OF AU OVERLAYERS ONTO CLEAVED (HG,CD)TE SURFACES
    DAVIS, GD
    BECK, WA
    BYER, NE
    DANIELS, RR
    MARGARITONDO, G
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02): : 546 - 550
  • [8] INTERFACE REACTIONS AT CU-HG1-XCDXTE CONTACTS
    EHSANI, H
    BENE, RW
    [J]. JOURNAL OF APPLIED PHYSICS, 1986, 59 (08) : 2808 - 2811
  • [9] INTERFACE CHEMISTRY OF TERNARY SEMICONDUCTORS - LOCAL MORPHOLOGY OF THE HG1-XCDXTE(110)-CR INTERFACE
    FRANCIOSI, A
    PHILIP, P
    PETERMAN, DJ
    [J]. PHYSICAL REVIEW B, 1985, 32 (12): : 8100 - 8107
  • [10] FRIEDMAN DCS, UNPUB