GROWTH-KINETICS OF AMORPHOUS HYDROGENATED SILICON STUDIED BY PULSED RF DISCHARGE

被引：16

作者：

HAMASAKI, T

UEDA, M

HIROSE, M

OSAKA, Y

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1983年 / 59-6卷 / DEC期

关键词：

D O I：

10.1016/0022-3093(83)90262-4

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：679 / 682

页数：4

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