DIFFUSION BARRIER PROPERTIES OF THIN SELECTIVE CHEMICAL VAPOR-DEPOSITED TUNGSTEN FILMS

被引：31

作者：

SHEN, BW ^{[1
]}

SMITH, GC ^{[1
]}

ANTHONY, JM ^{[1
]}

MATYI, RJ ^{[1
]}

机构：

[1] TEXAS INSTRUMENTS INC, CENT RES LAB, DALLAS, TX 75265 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 06期

关键词：

D O I：

10.1116/1.583460

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1369 / 1376

页数：8

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