SPUTTER ETCHING EFFECTS ON GAAS SCHOTTKY JUNCTIONS

被引:32
作者
YAMASAKI, K
ASAI, K
SHIMADA, K
MAKIMURA, T
机构
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D O I
10.1149/1.2123674
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:2760 / 2764
页数:5
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[1]  
DEVLIN WJ, 1980, ELECTRON LETT, V15, P92
[2]   ELECTRICAL DEFECTS IN SILICON INTRODUCED BY SPUTTERING AND SPUTTER-ETCHING [J].
GRUSELL, E ;
BERG, S ;
ANDERSSON, LP .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (07) :1573-1576
[3]   STUDY OF ION-BOMBARDMENT DAMAGE ON A GE (111) SURFACE BY LOW-ENERGY ELECTRON DIFFRACTION [J].
JACOBSON, RL ;
WEHNER, GK .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (09) :2674-&
[4]   EFFECTS OF ION ETCHING ON PROPERTIES OF GAAS [J].
KAWABE, M ;
KANZAKI, N ;
MASUDA, K ;
NAMBA, S .
APPLIED OPTICS, 1978, 17 (16) :2556-2561
[5]   GAAS-MESFET FOR DIGITAL APPLICATION [J].
KOHN, E .
SOLID-STATE ELECTRONICS, 1977, 20 (01) :29-&
[6]   DEPTHS OF LOW-ENERGY ION BOMBARDMENT DAMAGE IN GERMANIUM [J].
MACDONALD, RJ ;
HANEMAN, D .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (04) :1609-+
[7]   REACTIONS OF VACUUM-DEPOSITED THIN SCHOTTKY-BARRIER METALLIZATIONS ON GALLIUM-ARSENIDE [J].
MUKHERJEE, SD ;
MORGAN, DV ;
HOWES, MJ ;
SMITH, JG ;
BROOK, P .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02) :138-140
[8]   EFFECTS OF SPUTTERING DAMAGE ON CHARACTERISTICS OF MOLYBDENUM-SILICON SCHOTTKY-BARRIER DIODES [J].
MULLINS, FH ;
BRUNNSCHWEILER, A .
SOLID-STATE ELECTRONICS, 1976, 19 (01) :47-50
[9]   PHOTOLUMINESCENCE MEASUREMENT OF ION-ETCHED GAAS SURFACE [J].
NAMBA, S ;
KAWABE, M ;
KANZAKI, N ;
MASUDA, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1348-1351
[10]   INVESTIGATION OF RF SPUTTER ETCHED SILICON SURFACES USING HELIUM ION BACKSCATTER [J].
SACHSE, GW ;
MILLER, WE ;
GROSS, C .
SOLID-STATE ELECTRONICS, 1975, 18 (05) :431-435