MICROSTRUCTURES AND HYDROGEN-BONDING ENVIRONMENTS OF A-SI-H FILMS PREPARED BY RF SPUTTERING IN PURE HYDROGEN

被引:8
作者
ISHIDA, H
NODA, M
SHIMIZU, H
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1983年 / 22卷 / 02期
关键词
D O I
10.1143/JJAP.22.L73
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:L73 / L75
页数:3
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