DESIGN AND TEST OF A THROUGH-THE-MASK ALIGNMENT SENSOR FOR A VERTICAL STAGE X-RAY ALIGNER

被引：9

作者：

NELSON, M

KREUZER, JL

GALLATIN, G

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587508

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3251 / 3255

页数：5

共 10 条

[1] ALIGNMENT OF X-RAY LITHOGRAPHY MASKS USING A NEW INTERFEROMETRIC-TECHNIQUE - EXPERIMENTAL RESULTS [J].

AUSTIN, S ;

SMITH, HI ;

FLANDERS, DC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03) :984-986

[2] NEW INTERFEROMETRIC ALIGNMENT TECHNIQUE [J].

FLANDERS, DC ;

SMITH, HI ;

AUSTIN, S .

APPLIED PHYSICS LETTERS, 1977, 31 (07) :426-428

[3]

KERN DP, 1980, P S ELECTRON ION BEA, P491

[4] PHOTOLITHOGRAPHIC MASK ALIGNMENT USING MOIRE TECHNIQUES [J].

KING, MC ;

BERRY, DH .

APPLIED OPTICS, 1972, 11 (11) :2455-&

[5]

KLEINKNECHT HP, 1979, P SOC PHOTOOPT INSTR, V174, P63

[6] HIGH-PRECISION INTERFEROMETRIC ALIGNMENT USING CHECKER GRATING [J].

TABATA, M ;

TOJO, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06) :1980-1983

[7] OPTICAL ULTRA-MICROMETER TECHNIQUE UTILIZING A COMPOSITE DIFFRACTION GRATING [J].

TORII, Y ;

MIZUSHIMA, Y .

OPTICS COMMUNICATIONS, 1977, 23 (01) :135-138

[8]

UCHIDA N, 1989, B JPN SOC PREC ENG, V23, P140

[9] A MASK-TO-WAFER ALIGNMENT AND GAP SETTING METHOD FOR X-RAY-LITHOGRAPHY USING GRATINGS [J].

UCHIDA, N ;

ISHIBASHI, Y ;

HIRANO, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06) :3202-3206

[10]

Uchida Y., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V661, P95, DOI 10.1117/12.938597

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