SUB-50-NM LITHOGRAPHY IN AMORPHOUS SE-GE INORGANIC RESIST BY ELECTRON-BEAM EXPOSURE

被引：27

作者：

SINGH, B

BEAUMONT, SP

BOWER, PG

WILKINSON, CDW

机构：

来源：

APPLIED PHYSICS LETTERS | 1982年 / 41卷 / 10期

关键词：

D O I：

10.1063/1.93347

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：1002 / 1004

页数：3

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