DIRECT PATTERNING OF SPIN-ON GLASS BY FOCUSED ION-BEAM IRRADIATION

被引：9

作者：

KOH, YB ^{[1
]}

GOTO, T ^{[1
]}

YANAGISAWA, J ^{[1
]}

GAMO, K ^{[1
]}

机构：

[1] OSAKA UNIV,EXTREME MAT RES CTR,TOYONAKA,OSAKA 560,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1992年 / 31卷 / 12B期

关键词：

SPIN-ON GLASS (SOG); FOCUSED ION BEAM (FIB); LITHOGRAPHY; FOURIER TRANSFORM INFRARED SPECTROSCOPY (FTIR); X-RAY PHOTOELECTRON SPECTROSCOPY (XPS);

D O I：

10.1143/JJAP.31.4479

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Maskless patterning of spin-on glass (SOG) by focused ion beam (FIB) irradiation was investigated. Silanol-type SOG and 100 keV Ga FIB were employed as SOG material and ion beam, respectively. Heat treatment up to 850-degrees-C was also performed for comparison with ion beam irradiation effect. The spectra of Fourier transform infrared (FTIR) transmission and X-ray photoelectron spectroscopy (XPS) for SOG material showed that the crosslinking reaction was induced in SOG by ion beam irradiation, which is almost the same behavior as that induced by the heat treatment. As a result, SOG can be used as a negative-type ion beam resist and patterned masklessly by FIB irradiation. The threshold dose for the exposure of SOG film using FIB was about 1.5 muC/cm2 and almost 2-3 orders of magnitude less than that for an electron beam (EB). A 0. 15-mum line-and-space (L / S) pattern was delineated by 100 keV Ga FIB irradiation.

引用

页码：4479 / 4482

页数：4

共 7 条

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