CO-SPUTTERED SI-CR RESISTIVE FILMS

被引：4

作者：

FERNANDEZ, M ^{[1
]}

GONZALEZ, JP ^{[1
]}

ALBELLA, JM ^{[1
]}

MARTINEZDUART, JM ^{[1
]}

机构：

[1] UNIV AUTONOMA MADRID,DEPT FIS APLICADA,E-28049 MADRID,SPAIN

来源：

JOURNAL OF MATERIALS SCIENCE | 1987年 / 22卷 / 10期

关键词：

FILMS - Thickness Measurement - INTEGRATED CIRCUITS; HYBRID - RESISTORS - Thin Films;

D O I：

10.1007/BF01161481

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Si-Cr films of variable composition between pure silicon and pure chromium have been deposited by co-sputtering on to glass substrates and thermally oxidized silicon wafers. In order to assess the applications of the Si-Cr films to thin film resistors, the electrical characteristics of the films have been determined as a function of composition, thickness, thermal treatments, etc.

引用

页码：3703 / 3706

页数：4

共 8 条

[1] ELECTRICAL-PROPERTIES OF CO-SPUTTERED TANTALUM SILICIDES [J].

DENIS, J ;

FERNANDEZ, M ;

GONZALEZ, JP ;

ALBELLA, JM ;

MARTINEZDUART, JM .

THIN SOLID FILMS, 1985, 125 (3-4) :329-333

[2] AMORPHOUS CHROMIUM-SILICON - MATERIAL FOR KILO-OHM SHEET RESISTANCES [J].

HIEBER, K .

THIN SOLID FILMS, 1979, 57 (02) :353-357

[3] STRUCTURAL AND ELECTRICAL-PROPERTIES OF CRSI2 THIN-FILM RESISTORS [J].

HIEBER, K ;

DITTMANN, R .

THIN SOLID FILMS, 1976, 36 (02) :357-360

[4] A CLOSED SYSTEM FABRICATION OF CHROMIUM SILICIDE THIN-FILM RESISTORS [J].

KARULKAR, PC .

THIN SOLID FILMS, 1984, 121 (03) :259-262

[5]

MURARKA SP, 1983, SILICIDES VLSI APPLI

[6] THE MAGNETIC SUSCEPTIBILITY AND ELECTRICAL RESISTIVITY OF SOME TRANSITION METAL SILICIDES [J].

ROBINS, DA .

PHILOSOPHICAL MAGAZINE, 1958, 3 (28) :313-327

[7] CR-SI RESISTIVE FILMS PRODUCED BY MAGNETRON PLASMATRON SPUTTERING [J].

SCHILLER, S ;

HEISIG, U ;

STEINFELDER, K ;

KORNDOERFER, C .

THIN SOLID FILMS, 1982, 96 (04) :279-284

[8] SPUTTERED SILICON-CHROMIUM RESISTIVE FILMS [J].

WAITS, RK .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (02) :308-&

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